What is PIC?

PIC is an acronym for “particle in cell” and is a numerical calculation method used in electromagnetic field simulation and plasma physics research.
Our engineers who have studied PIC have developed software as a general-purpose tool and provide it to the industrial field.

 

What is PLASMA?

Matter is often divided into solid, liquid, and gas, but plasma can be created by further heating gas.

For this reason, plasma is often described as the “fourth state” of matter.

Plasma is the ionized state of matter.

Ionization is a phenomenon in which a molecule or atom breaks apart and separates into electrons and ions.

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Plasma is created when particles (ions, electrons, and atoms) collide with each other.
What kind of environment produces plasma?
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Plasma is mainly generated in ultra-high temperature regions such as the sun or when high voltages are applied to gases.

 

What is PIC-PLASMA3D?

PIC-PLASMA3D is the easiest software for simulating ionized plasma. It is inexpensive and easy to use, so anyone can use it easily.

PIC-PLASMA3D can be used on ordinary Windows PCs. The software is designed to be easy to use, with all processes from calculation to visualization completed within the software.

We hope you will make use of this software for the improvement and development of products that use plasma.

 

Analysis Examples

It is possible to specify any plasma position from the customer's cad data and analyze it.

Electric field analysis

Analysis of plasma ion source and plasma electron source

Electric and magnetic field analysis

Plasma analysis of magnetron sputter

 

The above analysis is an example.

 

Analysis Results

Visualization of the plasma trajectory enables optimal design of your equipment and products.

 

Fig.1：Plasma Ion Source Analysis Results

Fig.2：Analysis results of magnetron sputtering system

 

The video above shows the actual PIC-PLASMA3D analysis.

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Figure 1 simulates the process of extracting ions from the plasma initially present in the plasma generator chamber by means of a drawer electrode.
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Figure 2 shows a simulation of free electrons in a magnetron sputtering system, which confirms that the magnetic field traps electrons near the target.

The data in the movie represent the number density of ions and electrons [pcs/m3], respectively.

 

Download PIC-PLASMA3D Trial Version